Project information
Characterization of multilayer systems with randomly rough boundaries by means of optical and X - ray methods
- Project Identification
- GA202/98/0988
- Project Period
- 1/1998 - 1/2000
- Investor / Pogramme / Project type
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Czech Science Foundation
- Standard Projects
- MU Faculty or unit
- Faculty of Science
- Cooperating Organization
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Institute of Scientific Instruments of the ASCR, v. v. i.
- Responsible person RNDr. Pavel Pokorný
- Responsible person prof. RNDr. Miloslav Ohlídal, CSc.
Within both perturbation and diffraction theories new theoretical approaches enabling us to express optical quantities of multilayer systems with randomly rough boundaries will be formulated. These quantities will be connected with coherently and incoher ently scattered light. The theoretical results will be compared with experimental results achieved for chosen rough multilayer systems. Analytical methods allowing a determination of the optical and statistical parameters of the systems mentioned will be developed. Moreover, a comparison of the new theoretical approach developed within the perturbation theory with approaches employed in the X-ray region will be carried out. Possibilities concerning an extension of this optical approach to the X-ray regi on will also be investigated. A combination of optical and X-ray methods will be used for analyzing various thin film systems.
Publications
Total number of publications: 34
2000
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Analysis of Slightly Rough Thin Films by Optical Methods and AFM
Mikrochim. Acta, year: 2000, volume: 132, edition: 1
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Analysis of thin films by optical multi-sample methods
Acta Physica Slovaca, year: 2000, volume: 50, edition: 4
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Atomic force microscopy measurements of surface roughness quantities important in optics of surfaces and thin films
Proceedings of the 4th Seminar on Quantitative Microscopy, year: 2000
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Ellipsometry of Thin Film Systems
Progress in Optics, Vol. 41 (Ed. E. Wolf), edition: Vyd. 1, year: 2000, number of pages: 102 s.
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Matrix formalism for imperfect thin films
Acta physica slovaca, year: 2000, volume: 50, edition: 4
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Optical characterization of inhomogeneous thin films of ZrO2 by spectroscopic ellipsometry and spectroscopic reflectometry
Surface and Interface Analysis, year: 2000, volume: 30, edition: 1
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Optical characterization of thin films with randomly rough boundaries using the photovoltage method
Thin Solid Films, year: 2000, volume: 366, edition: 1
1999
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Comparison of optical and non-optical methods for measuring surface roughness
Proceedings of SPIE 3820, 11th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, year: 1999
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Complete Optical Characterization of the SiO2/Si System by Spectroscopic Ellipsometry Spectroscopic Reflectometry and Atomic Force Microscopy
Surface and Interface Analysis, year: 1999, volume: 28, edition: 1
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Determination of the basic parameters characterizing the roughness of metal surfaces by laser light scattering
Journal of modern optics, year: 1999, volume: 46, edition: 2