Project information
R&D centre for plasma and nanotechnology surface modifications
(CEPLANT)
- Project Identification
- LM2023039
- Project Period
- 1/2023 - 12/2026
- Investor / Pogramme / Project type
-
Ministry of Education, Youth and Sports of the CR
- Large Infrastructures for Research, Development and Innovation
- MU Faculty or unit
-
Faculty of Science
- doc. Mgr. Dušan Kováčik, PhD.
- Nima Bolouki, PhD.
- doc. RNDr. Vilma Buršíková, Ph.D.
- Mgr. Stanislava Debnárová, Ph.D.
- Richard Gaetan Paul Drevet, Ph.D.
- Mgr. Jan Dvořák, Ph.D.
- doc. Mgr. Pavel Dvořák, Ph.D.
- Mgr. Matej Fekete, Ph.D.
- Jianyu Feng
- Mgr. Daniel Franta, Ph.D.
- Pedram Ghourchi Beigi
- doc. Mgr. Jaroslav Hnilica, Ph.D.
- doc. Mgr. Tomáš Hoder, Ph.D.
- Ali Jamaati Kenari
- Mgr. Ondřej Jašek, Ph.D.
- Mgr. Jana Jurmanová, Ph.D.
- Mgr. Jakub Kelar, Ph.D.
- RNDr. Zlata Kelar Tučeková, PhD.
- Mgr. Pavel Kosík
- doc. Mgr. Dušan Kováčik, PhD.
- RNDr. Richard Krumpolec, PhD.
- Mgr. Martina Mazalová, Ph.D.
- Mgr. Martina Mrkvičková, Ph.D.
- doc. Mgr. Zdeněk Navrátil, Ph.D.
- prof. RNDr. Ivan Ohlídal, DrSc.
- Mgr. Michal Pazderka, Ph.D.
- dr. Dušan Plašienka
- Mgr. Roman Přibyl
- Mgr. Slavomír Sihelník, Ph.D.
- Mgr. Dana Skácelová, Ph.D.
- doc. Mgr. Pavel Slavíček, Ph.D.
- RNDr. Monika Stupavská, PhD.
- Mgr. Petra Šrámková, PhD.
- Mgr. Vlasta Štěpánová, Ph.D.
- prof. Mgr. Petr Vašina, Ph.D.
- Mgr. Július Vida, Ph.D.
- Mgr. Jiří Vohánka, Ph.D.
- Leila Zahedi
- Mgr. František Zelenák
The research infrastructure built on the centre CEPLANT established in 2010 and there is a direct continuity to the LM2018097 project. The research focus is on providing surface nanoscience-based clean technology solutions to industry on the basis of needs-driven fundamental research of an international excellence in the fields of plasma physics and plasma-chemistry.
Sustainable Development Goals
Masaryk University is committed to the UN Sustainable Development Goals, which aim to improve the conditions and quality of life on our planet by 2030.
Publications
Total number of publications: 88
2025
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ADVANCED DCSBD-BASED PLASMA TECHNOLOGIES FOR SURFACE MODIFICATIONS AND BIO-APPLICATIONS
Book of Contributed Papers: 25th Symposium on Application of Plasma Processes and 14th EU-Japan Joint Symposium on Plasma Processing, Štrbské Pleso, Slovakia, 31 January – 5 February 2025., year: 2025
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ATMOSPHERIC PRESSURE PLASMA TREATMENT AND FUNCTIONALIZATION OF GLASS SURFACE FOR RELIABLE ADHESIVE BONDING
Book of Contributed Papers: 25th Symposium on Application of Plasma Processes and 14th EU-Japan Joint Symposium on Plasma Processing, Štrbské Pleso, Slovakia, 31 January – 5 February 2025, year: 2025
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Different Grain Sizes of MgAl2O4 Doped Alumina and Its Influence on SPD, CDBD, and APTD
Plasma Chemistry and Plasma Processing, year: 2025, volume: 45, edition: 1, DOI
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Effects of nitrogen content on microstructure and mechanical properties of DC magnetron sputtered Cr-Mn-Mo-Si-Y-(N) high entropy coatings
Surface and Coatings Technology, year: 2025, volume: 497, edition: February, DOI
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Evaluation of atmospheric pressure plasma surface modification of un-vulcanized NR/SBR blend
Vacuum, year: 2025, volume: 233, edition: March, DOI
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Exploring different approaches of multipulse HiPIMS
Surface and Coatings Technology, year: 2025, volume: 496, edition: January, DOI
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GENERATION OF REACTIVE SPECIES VIA SURFACE DIELECTRIC BARRIER DISCHARGE IN DIRECT CONTACT WITH WATER
Book of Contributed Papers: 25th Symposium on Application of Plasma Processes and 14th EU-Japan Joint Symposium on Plasma Processing, Štrbské Pleso, Slovakia, 31 January – 5 February 2025., year: 2025
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Influence of oxygen flow on the structure, chemical composition, and dielectric strength of AlxTayOz thin films deposited by pulsed-DC reactive magnetron sputtering
Surface and Coatings Technology, year: 2025, volume: 498, edition: February, DOI
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Investigation of the failure mechanisms of Zr alloy with Cr2AlC coatings using in-situ bending tests: Experiments and simulations
Engineering Failure Analysis, year: 2025, volume: 167, edition: January, DOI
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On the Ar I 419.8 nm/751.5 nm (3p5/2p5) line intensity ratio for electric field measurement in dielectric barrier discharge in argon at atmospheric pressure
Plasma Sources Science and Technology, year: 2025, volume: 34, edition: 1, DOI